Surface chemical analysis. Depth profiling. Measurement of sputtering rate. Mesh-replica method using a mechanical stylus profilometer Ingestion-build-225643 Who is ISO 9282-1 -

Who is ISO 9282-1 - Encoding principles for picture representation in a 7-bit or 8-bit environment for

25 % (m/m) of sulfur in natural iron ores

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Surface chemical analysis. Depth profiling. Measurement of sputtering rate. Mesh-replica method using a mechanical stylus profilometer Ingestion-build-225643 Who is ISO 9282-1 -1 Scope This Technical Report describes a method for determining ion sputtering rates for depth profiling measurements with Auger electron spectroscopy (AES) and X ray photoelectron spectroscopy (XPS) where the specimen is ion sputtered over a region with an area between 0,4 mm2 and 3,0 mm2. This Technical Report is applicable only to a laterally homogeneous bulk or single layered material where the ion sputtering rate is determined from the sputtered