M07000 - SEMI M70 - Test Method for Determining Wafer-Near-Edge Geometry Using Partial Wafer Site Flatness StdPbc-0912 It is essentially an online

It is essentially an online version of the Excel-based fab database that is updated with greater frequency with a user-friendly interface

SEMI MF951 — Test Method for Determination of Radial Interstitial Oxygen Variation in Silicon Wafers

Measurements made at the three positions specified in this Guide do not provide complete information about the roundness of the wafer

Such impurities may be introduced into the wafer during manufacture or during various processing steps

The Guide focuses on analysis of HPIX resin used in UPW

M07000 - SEMI M70 - Test Method for Determining Wafer-Near-Edge Geometry Using Partial Wafer Site Flatness StdPbc-0912 It is essentially an onlineWafer near edge geometry can significantly affect the yield of semiconductor device processing. Knowledge of near edge geometrical properties can help the producer and consumer to determine if the dimensional characteristics of a wafer satisfy given geometrical requirements. This Test Method is suitable quantifying the near edge geometry of wafers used in semiconductor device processing. The PSFQR or PSFQD metric is suitable for quantifying near edge